The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2015

Filed:

Feb. 12, 2010
Applicants:

Koki Daikoku, Kanagawa, JP;

Masato Yoshizaki, Kanagawa, JP;

Shuichi Sato, Kanagawa, JP;

Inventors:

Koki Daikoku, Kanagawa, JP;

Masato Yoshizaki, Kanagawa, JP;

Shuichi Sato, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 9/24 (2006.01); G01N 29/44 (2006.01); G01N 29/11 (2006.01); G01N 29/24 (2006.01);
U.S. Cl.
CPC ...
G01N 29/44 (2013.01); G01N 29/4472 (2013.01); G01N 29/11 (2013.01); G01N 29/2412 (2013.01); G01N 2291/0425 (2013.01); G01N 2291/044 (2013.01); G01N 2291/2634 (2013.01);
Abstract

(A) first data for defect amount estimation for the guided wave of a first frequency is obtained, the data indicating a relationship among amplitude of the reflected wave, a defect cross-sectional area and a defect width. (B) second data for defect amount estimation for the guided wave of a second frequency is obtained, the data indicating a relationship among amplitude of the reflected wave, a defect cross-sectional area and a defect width. (C) a guided wave of the first frequency is generated, and amplitude of a reflected wave is detected as first amplitude. (D) a guided wave of the second frequency is generated, and amplitude of a reflected wave is detected as second amplitude. (E) on a basis of the first and second data and the first and second amplitude, a defect cross-sectional area and a defect width of the defect part are estimated.


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