The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2015
Filed:
Jun. 14, 2011
Adam Ian Nadel, Woodbridge, VA (US);
Adam Scott Ehrmantraut, Manassas Park, VA (US);
Adam Ian Nadel, Woodbridge, VA (US);
Adam Scott Ehrmantraut, Manassas Park, VA (US);
Aurora Flight Sciences Corporation, Manassas, VA (US);
Abstract
The present disclosure endeavors to provide an SHM system and method using a conductive material (e.g., CNT) to measure changes in a layered structure. Change in capacitance of a layered structure may be measured over time thereby indicating a change in the structural integrity of the material. The SHM system may be embedded with, or within, the layered structure such that the system is effectively part of the material. Alternatively, it may be external to the layered structure such that the system is a separate device used to measure the capacitance. The SHM system may also localize any changes in a layered structure by using, for example, strips or panels of conductive material on opposite sides of the layered structure being measured. Damage within overlapping portions of the conductive material provides localization capability where varying the size of the strips or panels may be use to vary the sensitivity and resolution of both the locations and size of the defect.