The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2015

Filed:

Jun. 10, 2011
Applicants:

Hong Wang, Cupertino, CA (US);

Kenneth Tsai, Emerald Hills, CA (US);

Inventors:

Hong Wang, Cupertino, CA (US);

Kenneth Tsai, Emerald Hills, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/00 (2006.01); C25F 3/02 (2006.01); C25F 1/00 (2006.01); C25F 1/02 (2006.01); C25F 5/00 (2006.01); C23C 14/34 (2006.01); C23F 1/36 (2006.01); C22B 7/00 (2006.01);
U.S. Cl.
CPC ...
C25F 5/00 (2013.01); C22B 7/007 (2013.01); C23C 14/3414 (2013.01); C23F 1/36 (2013.01);
Abstract

A method of cleaning metal-containing deposits from a metal surface of a process chamber component includes immersing the metal surface in an electrochemical cleaning bath solution. A negative electrical bias is applied to the metal surface to electrochemically clean the metal-containing deposits from the metal surface. The cleaning method is capable of removing metal-containing deposits such as tantalum-containing deposits from the metal surface substantially without eroding the surface, and may be especially advantageous in the cleaning of components having textured surfaces.


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