The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2015

Filed:

Apr. 06, 2011
Applicants:

Masafumi Watanabe, Okayama, JP;

Junichi Amemiya, Okayama, JP;

Ikutaro Kuzuhara, Okayama, JP;

Inventors:

Masafumi Watanabe, Okayama, JP;

Junichi Amemiya, Okayama, JP;

Ikutaro Kuzuhara, Okayama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 493/10 (2006.01);
U.S. Cl.
CPC ...
C07D 493/10 (2013.01);
Abstract

In the production of spiroglycol by the reaction of pentaerythritol and hydroxypivalaldehyde in water in the presence of an acid catalyst, (A) a total content of amines and amine salts in hydroxypivalaldehyde is reduced to 1.5% by weight or lower; (B) seed crystals are added to the reaction system before initiating the reaction and/or during the reaction in an amount from 1.5 to 30% by weight on the basis of the total feed amount of pentaerythritol, hydroxypivalaldehyde, water, the acid catalyst and the seed crystals, each being fed into the reaction system; (C) the pH of the reaction system is kept from 0.1 to 4.0 from initiation of the reaction to completion of the reaction; and (D) the sum of a maximum theoretical amount of spiroglycol to be synthesized from pentaerythritol and hydroxypivalaldehyde to be fed into the reaction system and an amount of spiroglycol contained in the seed crystals to be added to the reaction system is controlled within a range from 5 to 35% by weight on the basis of the total feed amount. The spiroglycol produced has an increased particle size. By washing the spiroglycol with a basic solution, the heat stability is improved.


Find Patent Forward Citations

Loading…