The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2015

Filed:

Jan. 26, 2012
Applicants:

Francesco DE Angelis, Genova, IT;

Enzo Di Fabrizio, Rome, IT;

Inventors:

Francesco De Angelis, Genova, IT;

Enzo Di Fabrizio, Rome, IT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B31D 3/00 (2006.01); B05D 3/06 (2006.01); B81C 1/00 (2006.01); B82Y 35/00 (2011.01); G01Q 60/40 (2010.01); G01Q 70/16 (2010.01);
U.S. Cl.
CPC ...
B05D 3/068 (2013.01); B81C 1/00087 (2013.01); B82Y 35/00 (2013.01); G01Q 60/40 (2013.01); G01Q 70/16 (2013.01);
Abstract

Methods are provided for obtaining hollow nano-structures which include the steps of providing a suspended film starting layer on a support substrate, depositing on the starting layer a sacrificial layer, performing, in progressive sequence, a complete erosion phase of said support substrate and starting layer and performing an at least partial erosion phase of the sacrificial layer previously deposited on the starting layer so as to obtain holes passing through the starting layer and passing or non passing through the sacrificial layer, depositing, on the side of the support substrate opposite to that where the starting layer is put, at least one covering layer arranged to internally cover the holes created by the progressive erosion. Hollow nano-structures formed by such methods are also provided.


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