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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9063411 B1

PDFFull Text
Date of Patent:
Jun. 23, 2015

Filed:

Dec. 13, 2012

Additive for resist and resist composition comprising same

Applicant:

Korea Kumho Petrochemical Co., Ltd., Seoul, JP;

Inventors:

Joon Hee Han, Namyangju-si, KR;

Hyun Sang Joo, Daejeon, KR;

Jin Ho Kim, Asan-si, KR;

Hyun Soon Lim, Asan-si, KR;

Assignee:

KOREA KUMHO PETROCHEMICAL CO., LTD., Seoul, KR;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Anca Eoff

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/004 (2006.01); C08F 132/08 (2006.01); C08F 220/18 (2006.01); C08F 220/22 (2006.01); C08F 232/08 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C08F 132/08 (2013.01); C08F 220/18 (2013.01); C08F 220/22 (2013.01); C08F 232/08 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01);
Abstract

A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to prevent materials from being leached in water during exposure of immersion lithography and is converted to have hydrophilicity by deprotection reaction during development. As a result, a micropattern of a resist film with excellent sensitivity and high resolution is formed. In Formula 1, the substituents are defined as described in the specification.

Find Patent Forward Citations

Han, Joon. (2015). Additive for resist and resist composition comprising same (U.S. Patent No. 9063411). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9063411

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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