The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2015
Filed:
Dec. 21, 2012
Samsung Display Co., Ltd., Gyeonggi-do, KR;
Jin-Soo Jung, Gyeonggi-do, KR;
Young-Gu Kim, Gyeonggi-do, KR;
Jun-Woo Lee, Gyeonggi-do, KR;
Baek-Kyun Jeon, Gyeonggi-do, KR;
Min-Sik Jung, Seoul, KR;
Samsung Display Co., Ltd., Yongin, Gyeonggi-do, KR;
Abstract
In a photo alignment method, a substrate and a mask are aligned so that the substrate is spaced apart from the mask by a predetermined gap. An organic layer is formed on the substrate. The mask has a transmission portion and a light blocking portion. Light is irradiated through the mask in a direction substantially parallel with an interface between the transmission portion and the light blocking portion of the mask. Polymer chains are formed on an upper portion of the organic layer. The polymer chains are aligned in an alignment direction toward an incident direction of the light. Locations of the substrate and the mask are sensed in real time. The mask is transported to a predetermined location with respect to the substrate based on the sensed locations of the substrate and the mask.