The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2015

Filed:

Dec. 21, 2011
Applicants:

Fumitaro Masaki, Utsunomiya, JP;

Akira Miyake, Nasukarasuyama, JP;

Inventors:

Fumitaro Masaki, Utsunomiya, JP;

Akira Miyake, Nasukarasuyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/06 (2006.01); F21V 9/04 (2006.01); G03B 27/32 (2006.01); G03B 27/54 (2006.01); G02B 5/08 (2006.01); G03F 7/20 (2006.01); G21K 1/06 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
G02B 5/0816 (2013.01); G03F 7/702 (2013.01); G03F 7/70233 (2013.01); G03F 7/70958 (2013.01); G21K 1/062 (2013.01); G21K 2201/064 (2013.01); G21K 2201/067 (2013.01); G03F 7/70316 (2013.01); B82Y 10/00 (2013.01);
Abstract

A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.


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