The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2015
Filed:
Jun. 12, 2012
Applicant:
Claudia Yi-chen Lee, Altadena, CA (US);
Inventor:
Claudia Yi-Chen Lee, Altadena, CA (US);
Assignee:
Maven Technologies, LLC, Monrovia, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01); G01N 21/55 (2014.01); G01N 21/27 (2006.01); G01N 21/552 (2014.01); G01N 21/23 (2006.01); G01J 4/04 (2006.01); G01N 21/19 (2006.01); G01N 21/64 (2006.01); G01N 21/21 (2006.01);
U.S. Cl.
CPC ...
G01N 21/274 (2013.01); G01N 2021/212 (2013.01); G01N 21/553 (2013.01); G01N 21/23 (2013.01); G01J 4/04 (2013.01); G01N 21/19 (2013.01); G01N 21/648 (2013.01);
Abstract
A system, apparatus and method for analysis of a specimen using ellipsometric analysis. Polarization distortions caused by the propagation of polarized light within a substrate upon which a specimen is located are reduced by directing light at selected polarizations at the substrate alone and the specimen on the substrate. Image data is collected for each of the selected polarizations and processed to remove errors due to birefringence. Fourier transform processing is used to obtain polarization phase data for correcting polarization caused by any birefringence in the substrate, and optionally amplitude data.