The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2015

Filed:

Jan. 27, 2010
Applicants:

Toshiyuki Nakagawa, Kobe, JP;

Takamitsu Shigemoto, Urayasu, JP;

Yoshio Uetake, Tsukubamirai, JP;

Masahiro Kimoto, Tsukuba, JP;

Tetsuro Shigeno, Itami, JP;

Masaaki Muro, Itami, JP;

Naoyuki Nakamoto, Himeji, JP;

Inventors:

Toshiyuki Nakagawa, Kobe, JP;

Takamitsu Shigemoto, Urayasu, JP;

Yoshio Uetake, Tsukubamirai, JP;

Masahiro Kimoto, Tsukuba, JP;

Tetsuro Shigeno, Itami, JP;

Masaaki Muro, Itami, JP;

Naoyuki Nakamoto, Himeji, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01F 11/28 (2006.01); B67D 7/02 (2010.01); C23C 16/448 (2006.01); G01F 23/14 (2006.01);
U.S. Cl.
CPC ...
G01F 11/28 (2013.01); B67D 7/0272 (2013.01); C23C 16/4482 (2013.01); G01F 11/284 (2013.01); G01F 23/14 (2013.01);
Abstract

Disclosed are methods and apparatuses for supplying a liquid and controlling its level inside of a container. In particular, the liquid inside of the container may be a liquid material suitable for use in a chemical vapor deposition process, wherein the liquid is controlled and supplied in a manner which minimizes the introduction of impurities.


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