The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2015
Filed:
Jun. 15, 2007
Stephen Arthur Ifft, Longmont, CO (US);
Charles Theodore Orleskie, Berthoud, CO (US);
Stephen Arthur Ifft, Longmont, CO (US);
Charles Theodore Orleskie, Berthoud, CO (US);
Dieterich Standard, Inc., Boulder, CO (US);
Abstract
A process flow device that includes a self-averaging orifice plate type of primary flow element with a high pressure tap located on or incorporated into its upstream surface, and a low pressure tap located on or incorporated into its downstream surface, for measuring, by a differential pressure process, the volumetric rate of fluid flow at a point in a fluid carrying conduit where the velocity profile of the fluid is asymmetric with respect to the longitudinal axis of the conduit. The improved pressure tap configuration consists of two fluid conduits, one carried by each of the downstream and upstream faces of the orifice plate, establishing fluid communication between openings in the downstream and upstream faces of the orifice plate and their respective terminal pressure ports. Location of the pressure taps on the faces of the orifice plate in this manner allows for increased resolution of the pressure signals by minimizing the effects of upstream pipe flow disturbances on pressure taps used in conjunction with conditioning orifice plate primary flow elements, especially those with higher beta ratios.