The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2015

Filed:

Sep. 14, 2012
Applicants:

Shu-jen Han, Cortlandt Manor, NY (US);

Lian Guo, Croton-on-Hudson, NY (US);

Xuesong LI, Wappingers Falls, NY (US);

Inventors:

Shu-Jen Han, Cortlandt Manor, NY (US);

Lian Guo, Croton-on-Hudson, NY (US);

Xuesong Li, Wappingers Falls, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C25F 7/00 (2006.01); C25F 5/00 (2006.01); B32B 38/10 (2006.01); C25F 3/02 (2006.01); C01B 31/04 (2006.01);
U.S. Cl.
CPC ...
C25F 7/00 (2013.01); B32B 38/10 (2013.01); C01B 31/0453 (2013.01); C25F 3/02 (2013.01); C25F 5/00 (2013.01);
Abstract

An electroplating etching apparatus includes a power supply to output current, and a container configured to contain an electrolyte. A cathode is coupled to the container and configured to fluidly communicate with the electrolyte. An anode is electrically connected to the output, and includes a graphene layer. A metal substrate layer is formed on the graphene layer, and is etched from the graphene layer in response to the current flowing through the anode.


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