The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2015

Filed:

Oct. 16, 2012
Applicant:

The Regents of the University of Michigan, Ann Arbor, MI (US);

Inventors:

Stephen R. Forrest, Ann Arbor, MI (US);

Garen Vartanian, Ann Arbor, MI (US);

Cedric Rolin, Lasne, BE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/52 (2006.01); C23C 14/12 (2006.01); C23C 14/24 (2006.01); C23C 14/54 (2006.01); G01N 21/64 (2006.01); G01N 21/84 (2006.01);
U.S. Cl.
CPC ...
C23C 14/12 (2013.01); C23C 14/24 (2013.01); C23C 14/52 (2013.01); C23C 14/547 (2013.01); G01N 21/64 (2013.01); G01N 21/6489 (2013.01); G01N 2021/8416 (2013.01);
Abstract

A method for in-situ monitoring of gas-phase photoactive organic molecules in real time while depositing a film of the photoactive organic molecules on a substrate in a processing chamber for depositing the film includes irradiating the gas-phase photoactive organic molecules in the processing chamber with a radiation from a radiation source in-situ while depositing the film of the one or more organic materials and measuring the intensity of the resulting photoluminescence emission from the organic material. One or more processing parameters associated with the deposition process can be determined from the photoluminescence intensity data in real time providing useful feedback on the deposition process.


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