The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2015

Filed:

Jun. 27, 2012
Applicants:

Hong-sick Park, Suwon-Si, KR;

Wang-woo Lee, Suwon-Si, KR;

Bong-kyun Kim, Hwaseong-si, KR;

O-byoung Kwon, Jeonju-si, KR;

Kyung-bo Shim, Jeonju-si, KR;

Sang-hoon Jang, Jeonju-si, KR;

Inventors:

Hong-Sick Park, Suwon-Si, KR;

Wang-Woo Lee, Suwon-Si, KR;

Bong-Kyun Kim, Hwaseong-si, KR;

O-Byoung Kwon, Jeonju-si, KR;

Kyung-Bo Shim, Jeonju-si, KR;

Sang-Hoon Jang, Jeonju-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01); C09K 13/04 (2006.01); C23F 1/18 (2006.01); C23F 1/02 (2006.01); C23F 1/38 (2006.01); C23F 1/44 (2006.01); C09K 13/08 (2006.01); H01L 21/3213 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
C09K 13/04 (2013.01); C23F 1/18 (2013.01); C23F 1/02 (2013.01); C23F 1/38 (2013.01); C23F 1/44 (2013.01); C09K 13/08 (2013.01); H01L 21/32134 (2013.01); H01L 27/124 (2013.01); H01L 27/1288 (2013.01);
Abstract

An etching composition and a method of manufacturing a display substrate using the etching composition are disclosed. The etching composition includes phosphoric acid (HPO) of about 40% by weight to about 70% by weight, nitric acid (HNO) of about 5% by weight to about 15% by weight, acetic acid (CHCOOH) of about 5% by weight to about 20% by weight, and a remainder of water. Thus, a metal layer including copper may be stably etched.


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