The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Feb. 08, 2010
Ji-young Hwang, Daejeon, KR;
Sung-joon Min, Daejeon, KR;
In-seok Hwang, Daejeon, KR;
Dong-wook Lee, Daejeon, KR;
Sang-ki Chun, Daejeon, KR;
Ji-Young Hwang, Daejeon, KR;
Sung-Joon Min, Daejeon, KR;
In-Seok Hwang, Daejeon, KR;
Dong-Wook Lee, Daejeon, KR;
Sang-Ki Chun, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
The present invention provides: a method for manufacturing an insulated conductive pattern, wherein a conductive film and an insulation layer pattern are formed on a substrate, and the insulation layer pattern is reformed to cover a conductive pattern after formation of the conductive pattern by etching the conductive film using the insulation layer pattern as a mask; and a laminate manufactured thereby. According to the present invention, the number of processes is sharply reduced in comparison with the existing processes, and economic efficiency can be greatly improved.