The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2015

Filed:

Jan. 29, 2010
Applicants:

Tomomi Meguro, Settsu, JP;

Kenji Yamamoto, Settsu, JP;

Inventors:

Tomomi Meguro, Settsu, JP;

Kenji Yamamoto, Settsu, JP;

Assignee:

KANEKA CORPORATION, Osaka-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0224 (2006.01); H01L 21/283 (2006.01); H01L 51/52 (2006.01); H01L 31/0236 (2006.01); H01L 31/0392 (2006.01); H01L 31/0745 (2012.01); H01L 31/076 (2012.01); H01L 31/077 (2012.01); H01L 31/18 (2006.01); H05B 33/28 (2006.01);
U.S. Cl.
CPC ...
H01L 51/5203 (2013.01); H01L 31/022466 (2013.01); H01L 31/02366 (2013.01); H01L 31/03921 (2013.01); H01L 31/0745 (2013.01); H01L 31/076 (2013.01); H01L 31/077 (2013.01); H01L 31/1884 (2013.01); H01L 51/5268 (2013.01); H05B 33/28 (2013.01); Y02E 10/548 (2013.01);
Abstract

Disclosed is a substrate with a transparent conductive film, wherein an underlying layer and a transparent conductive film are arranged in this order on a transparent insulating substrate. The transparent conductive film-side surface of the underlying layer is provided with a pyramid-shaped or inverse pyramid-shaped irregular structure, and the transparent conductive film comprises a first transparent electrode layer which is formed on the underlying layer and a second transparent electrode layer which forms the outermost surface of the transparent conductive film. By forming a zinc oxide layer that serves as the second transparent electrode layer by a reduced pressure CVD method, a substrate with a transparent conductive film that is provided with an irregular structure smaller than that of the underlying layer can be obtained. The substrate with a transparent conductive film can improve the conversion efficiency of a photoelectric conversion device through an increased light trapping effect.


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