The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2015

Filed:

Mar. 29, 2010
Applicant:

Patrick John Mccann, Norman, OK (US);

Inventor:

Patrick John McCann, Norman, OK (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 35/22 (2006.01); H01L 35/16 (2006.01); H01L 33/28 (2010.01); H01L 35/12 (2006.01); H01L 35/26 (2006.01); H01L 33/06 (2010.01); B82Y 20/00 (2011.01); H01L 29/15 (2006.01); H01L 29/26 (2006.01); H01L 35/20 (2006.01);
U.S. Cl.
CPC ...
H01L 35/16 (2013.01); H01L 33/06 (2013.01); H01L 35/22 (2013.01); H01L 33/285 (2013.01); B82Y 20/00 (2013.01); H01L 29/155 (2013.01); H01L 29/26 (2013.01); H01L 35/20 (2013.01); H01L 35/12 (2013.01); H01L 35/26 (2013.01);
Abstract

A thermoelectric material having a high ZT value is provided. In general, the thermoelectric material is a thin film thermoelectric material that includes a heterostructure formed of IV-VI semiconductor materials, where the heterostructure includes at least one potential barrier layer. In one embodiment, the heterostructure is formed of IV-VI semiconductor materials and includes a first matrix material layer, a potential barrier material layer adjacent to the first matrix material layer and formed of a wide bandgap material, and a second matrix material layer that is adjacent the potential barrier material layer opposite the first matrix material layer. A thickness of the potential barrier layer is approximately equal to a mean free path distance for charge carriers at a desired temperature.


Find Patent Forward Citations

Loading…