The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2015

Filed:

Sep. 01, 2012
Applicants:

Maxime Darnon, Grenoble, FR;

Qinghuang Lin, Yorktown Heights, NY (US);

Inventors:

Maxime Darnon, Grenoble, FR;

Qinghuang Lin, Yorktown Heights, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 23/52 (2006.01); H01L 29/40 (2006.01); H01L 21/768 (2006.01); H01L 21/02 (2006.01); H01L 21/31 (2006.01); H01L 23/532 (2006.01); C08G 77/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76804 (2013.01); C08G 77/04 (2013.01); H01L 21/02126 (2013.01); H01L 21/02318 (2013.01); H01L 21/31 (2013.01); H01L 21/76807 (2013.01); H01L 21/76814 (2013.01); H01L 21/76825 (2013.01); H01L 21/76826 (2013.01); H01L 21/76828 (2013.01); H01L 21/76829 (2013.01); H01L 21/76832 (2013.01); H01L 21/76835 (2013.01); H01L 23/5329 (2013.01); H01L 23/53295 (2013.01); H01L 2221/1031 (2013.01); H01L 2924/12044 (2013.01);
Abstract

An interconnect structure is provided which includes at least one patterned and cured low-k material located directly on a surface of a substrate; and at least one least one conductively filled region embedded within an interconnect pattern located within the at least one patterned and cured low-k material, wherein the at least one conductively filled region has an inflection point at a lower region of the interconnect pattern that is in proximity to an upper surface of the substrate and the interconnect region having an upper region that has substantially straight sidewalls.


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