The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Aug. 16, 2012
Dong Ho Kim, Cheonan-si, KR;
Jinyoung Choi, Cheonan-si, KR;
Jaeseung Go, Suwon-si, KR;
Soomin Hwang, Hwaseong-si, KR;
Dong Ho Kim, Cheonan-si, KR;
Jinyoung Choi, Cheonan-si, KR;
Jaeseung Go, Suwon-si, KR;
Soomin Hwang, Hwaseong-si, KR;
SEMES CO., LTD., Chungcheongnam-Do, KR;
Abstract
A method and system for treating a substrate are provided. The system includes a coating unit, a pre/post-exposure treatment unit, and a developing unit. Each of the units includes a load port and an index module. The pre/post-exposure treatment unit includes first and second modules that are arranged in different layers. The first module performs a process for coating a protective layer on the wafer before an exposure process. The second module performs a process for cleaning the wafer and a post-exposure bake process after the exposure process.