The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
May. 31, 2013
Globalfoundries Inc., Grand Cayman, KY;
Eugene Barash, Niskayuna, NY (US);
Jiejie Xu, Clifton Park, NY (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
Methods and processes for establishing a rework threshold for layers applied after thermal processing during fabrication of semiconductor devices are provided. One method includes, for instance: obtaining a device after at least one laser annealing process is completed, the device including a substrate surface and at least one layer over the substrate surface; performing lithography on the at least one layer; positioning a first contact-to-gate layer over the at least one layer; checking alignment of electrical connections between the substrate surface and the first contact-to-gate layer; determining if an overlay error is present; and adjusting at least one subsequent fabrication process pursuant to the overlay error.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile