The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Feb. 20, 2013
Kabushiki Kaisha Toshiba, Tokyo, JP;
Shimon Maeda, Tokyo, JP;
Shinichi Ito, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, a method for generating mask data is configured to form a circuit pattern on a substrate using a directed self-assembly material. The method includes extracting a first region, setting a second region and setting a third region. The first region does not existing in the circuit pattern and existing in an initial pattern. The initial pattern includes a plurality of interconnect patterns extending in a first direction. The second region is formed by elongating the first region in a second direction intersecting the first direction. The second region straddles the first region in the second direction. The third region includes at least one of the second regions. The directed self-assembly material is disposed in the third region.