The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Sep. 21, 2012
Applicant:
Yuan-shin Materials Technology Corp., Taipei, TW;
Inventors:
Chun-Hsu Lin, Taipei, TW;
Chien-Yi Sun, Taipei, TW;
Yung-Yu Yin, Pingtung County, TW;
Chun-Shih Li, Pingtung County, TW;
Yo-Chun Chou, Taichung, TW;
Assignee:
YUAN-SHIN MATERIALS TECHNOLOGY CORP., Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 17/269 (2006.01); C07C 23/18 (2006.01);
U.S. Cl.
CPC ...
C07C 17/269 (2013.01); C07C 23/18 (2013.01); C07C 2103/92 (2013.01);
Abstract
The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.