The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Mar. 14, 2013
Applicant:
Rockwell Collins, Inc., Cedar Rapids, IA (US);
Inventors:
Paul R. Nemeth, Springville, IA (US);
John W. Sackfield, Marion, IA (US);
Assignee:
Rockwell Collins, Inc., Cedar Rapids, IA (US);
Primary Examiner:
Int. Cl.
CPC ...
B32B 7/02 (2006.01); C03C 15/00 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
C03C 15/00 (2013.01); H05K 1/0306 (2013.01);
Abstract
A method for texturing a glass substrate includes cleaning the glass substrate with at least one surfactant and etching the glass substrate using a caustic solution. The percentage of caustic solution is provided by controlling a fluid flow and temperature to control the depth of the etching. The method also includes acid cleaning the etched glass substrate to remove glass residuals and surfactants.