The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Nov. 01, 2013
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Korea University Industrial & Academic Collaboration Foundation, Seoul, KR;

Inventors:

Yun-kwon Park, Dongducheon-si, KR;

Byeoung-ju Ha, Seongnam-si, KR;

Byeong-Kwon Ju, Seoul, KR;

Jae-sung Rieh, Seoul, KR;

In-sang Song, Seoul, KR;

Jin-woo Lee, Seoul, KR;

Jea-shik Shin, Hwaseong-si, KR;

Young-min Park, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H03H 9/46 (2006.01); B81C 1/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G03F 7/00 (2006.01); H03H 3/007 (2006.01); H03H 9/24 (2006.01);
U.S. Cl.
CPC ...
H03H 9/462 (2013.01); B81B 2201/0271 (2013.01); B81C 1/00142 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 7/0002 (2013.01); H03H 3/0072 (2013.01); H03H 9/2463 (2013.01);
Abstract

A resonator fabrication method is provided. A method includes providing a plurality of electrode patterns disposed apart from each other on a substrate using a nano-imprint technique; and forming an extended electrode pattern connected to a plurality of electrode patterns, and forming a nano structure laid across an extended electrode patterns. Therefore, a nano-electromechanical system (NEMS) resonator is easily fabricated at a nanometer level.


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