The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Mar. 18, 2014
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Yoichi Kinoshita, Tokyo, JP;

Hajime Sasaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 29/06 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/778 (2013.01); H01L 29/7787 (2013.01); H01L 29/0607 (2013.01); H01L 29/0642 (2013.01); H01L 29/2003 (2013.01);
Abstract

A field-effect transistor includes a channel layer in which a two-dimensional electron gas is formed, an electron supply layer located on the channel layer, a source electrode located on the electron supply layer, a drain electrode located on the electron supply layer, a gate electrode located on the electron supply layer between the source electrode and the drain electrode, and an embedded layer embedded in the channel layer deeper than a two-dimensional electron gas region where the two-dimensional electron gas is formed, directly opposite an edge of the gate electrode on a side of the gate electrode toward the drain electrode. The embedded layer is a material that increases potential of the two-dimensional electron gas region.


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