The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2015
Filed:
Aug. 08, 2012
Mikio Arakawa, Ebina, JP;
Masataka Ito, Chigasaki, JP;
Mikio Arakawa, Ebina, JP;
Masataka Ito, Chigasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A process of forming an isolation region that defines an active region on a semiconductor wafer, a process of forming a photoelectric conversion element in the active region defined by the isolation region, and a process of forming a micro lens over the photoelectric conversion element are provided. Alignment in the process of forming the photoelectric conversion element and alignment in the process of forming the micro lens are performed using an alignment mark formed in the process of forming the isolation region.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile