The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Mar. 13, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Chengwen Pei, Danbury, CT (US);

Xi Li, Somers, NY (US);

Geng Wang, Stormville, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 29/76 (2006.01); H01L 29/06 (2006.01); H01L 21/308 (2006.01); H01L 29/66 (2006.01); H01L 29/94 (2006.01); H01L 21/84 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0692 (2013.01); H01L 21/84 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 29/66181 (2013.01); H01L 27/1087 (2013.01); H01L 29/945 (2013.01); H01L 27/1203 (2013.01);
Abstract

A trench capacitor and method of fabrication are disclosed. The SOI region is doped such that a selective isotropic etch used for trench widening does not cause appreciable pullback of the SOI region, and no spacers are needed in the upper portion of the trench.


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