The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Dec. 14, 2011
Applicants:

Kevin Charles Kraft, Plainfield, IL (US);

Ming-wei Paul Xu, Oswego, IL (US);

Min He, Downers Grove, IL (US);

Gerald James Carlson, Aurora, IL (US);

Inventors:

Kevin Charles Kraft, Plainfield, IL (US);

Ming-Wei Paul Xu, Oswego, IL (US);

Min He, Downers Grove, IL (US);

Gerald James Carlson, Aurora, IL (US);

Assignee:

Koninklijke Philips N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/10 (2006.01); H01J 35/08 (2006.01); H01J 35/12 (2006.01); H01J 9/02 (2006.01);
U.S. Cl.
CPC ...
H01J 35/105 (2013.01); H01J 35/10 (2013.01); H01J 35/08 (2013.01); H01J 35/12 (2013.01); H01J 9/02 (2013.01); H01J 35/108 (2013.01); H01J 2235/081 (2013.01); H01J 2235/084 (2013.01);
Abstract

An anode () is formed by building a carbon, such as a carbon reinforced carbon composite, or other ceramic substrate (). A ductile, refractory metal is electroplated on the ceramic substrate to form a refractory metal carbide layer () and a ductile refractory metal layer (), at least on a focal track portion (). A high-Z refractory metal is vacuum plasma sprayed on the ductile refractory metal layer to form a vacuum plasma sprayed high-Z refractory metal layer (), at least on the focal track portion.


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