Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device

Abstract

A polymer comprises the polymerized product of unsaturated monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, a photoacid-generating monomer, or a combination comprising at least one of the foregoing monomers, with a chain transfer agent of Formula (I); wherein in Formula (I), Z is a y valent Corganic group, L is a heteroatom or a single bond, Aand Aare each independently ester containing or non-ester containing and are fluorinated or non-fluorinated, and are independently Calkylene, Ccycloalkylene, Carylene, or Caralkylene, and Acontains a nitrile, ester, or aryl substituent group alpha to the point of attachment with sulfur, Xis a single bond, —O—, —S—, —C(═O)—O—, —O—C(═O)—, —O—C(═O)—O—, —C(═O)—NR—, —NR—C(═O)—, —NR—C(═O)—NR—, —S(═O)—O—, —O—S(═O)—O—, —NR—S(═O)—, or —S(═O)—NR, wherein R is H, Calkyl, Ccycloalkyl or Caryl, Yis an anionic group, Gis a metallic or non-metallic cation, and y is an integer of 1 to 6. A photoresist composition comprising the polymer, a coated substrate, comprising a layer of the photoresist composition, and a method of forming an electronic device from the photoresist, are also disclosed.