The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Sep. 23, 2011
Applicants:

Tomonori Katano, Kawasaki, JP;

Katsumi Taniguchi, Kawasaki, JP;

Kungen Teii, Fukuoka, JP;

Inventors:

Tomonori Katano, Kawasaki, JP;

Katsumi Taniguchi, Kawasaki, JP;

Kungen Teii, Fukuoka, JP;

Assignees:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 16/26 (2006.01); C23C 16/511 (2006.01); C23C 16/44 (2006.01); C23C 16/513 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/26 (2013.01); C23C 16/511 (2013.01); C23C 16/4412 (2013.01); C23C 16/513 (2013.01); H01J 37/32422 (2013.01); H01J 37/32458 (2013.01); H01J 37/3266 (2013.01); H01J 37/32834 (2013.01);
Abstract

A thin-film manufacturing method includes the steps of: generating a plasma from source gas; extracting ions from the plasma; and depositing a thin film on one side or both sides of a substrate to be deposited with the ions. The method is performed in an apparatus including: a plasma chamber generating the plasma; a film deposition chamber accommodating the substrate to be deposited; an ion transfer path for transferring the ions from the plasma chamber to the film deposition chamber; a branch pipe branching from the ion transfer path; and an exhaust system connected to the branch pipe. The thin film is formed while the source gas except the ions is exhausted from the branch pipe.


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