The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2015

Filed:

Nov. 14, 2012
Applicant:

Saint-gobain Glass France, Courbevoie, FR;

Inventors:

Claire Thoumazet, Paris, FR;

Martin Melcher, Herzogenrath, DE;

Arnaud Huignard, Campigne, FR;

Raphael Lante, Herzogenrath, DE;

Assignee:

SAINT-GOBAIN GLASS FRANCE, Courbevoie, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 17/34 (2006.01); C03C 23/00 (2006.01); C03C 17/42 (2006.01);
U.S. Cl.
CPC ...
C03C 17/42 (2013.01); C03C 23/006 (2013.01); C03C 2217/76 (2013.01); C03C 2218/1525 (2013.01); C03C 17/3417 (2013.01);
Abstract

A process for manufacturing a hydrophobic glazing by: (i) forming a carbon-rich SiOClayer at a surface of a mineral glass substrate via CVD by contacting the surface with a stream containing CH, SiH, and COwith an CH/SiHratio of less than or equal to 3.3 by volume, at a temperature of between 600° C. and 680° C.; (ii) forming a SiOlayer or a carbon-poor silicon oxycarbide layer with a mean C/Si ratio of less than 0.2 on the carbon-rich SiOClayer, thereby obtaining a layered substrate; (iii) annealing and/or shaping the layered substrate at a temperature of between 580° C. and 700° C.; (iv) activating the SiOlayer or the carbon-poor silicon oxycarbide layer by plasma treatment or acidic or basic chemical treatment; and (v) grafting, by covalent bonding, a fluorinated hydrophobic agent to the surface of the SiOlayer or the carbon-poor silicon oxycarbide layer.


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