The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2015
Filed:
Jun. 14, 2013
Takeshi Fukuda, Osaka, JP;
Tsuguo Watanabe, Osaka, JP;
Junji Hirose, Osaka, JP;
Kenji Nakamura, Osaka, JP;
Masato Doura, Osaka, JP;
Takeshi Fukuda, Osaka, JP;
Tsuguo Watanabe, Osaka, JP;
Junji Hirose, Osaka, JP;
Kenji Nakamura, Osaka, JP;
Masato Doura, Osaka, JP;
Toyo Tire & Rubber Co., Ltd., Osaka-shi, JP;
Abstract
A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.