The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2015
Filed:
May. 07, 2013
Dow Global Technologies Llc, Midland, MI (US);
George D. Caffell, Moss Beach, CA (US);
Gene A. McKay, Woodside, CA (US);
Steven E. O'Reilly, Menlo Park, CA (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
A hydroclone () including a tank () with a fluid inlet (), a filtered fluid outlet (), an effluent outlet (), a process fluid outlet () and a chamber () including an inner peripheral wall () centered about a central axis (X). The hydroclone further includes: i) a filter assembly () located within the chamber () which has an outer membrane surface () symmetrically located about the central axis (X) and encloses a filtrate chamber () that is in fluid communication with the filtered fluid outlet (), and ii) a cleaning assembly () concentrically located and rotatably engaged about the membrane surface (). A fluid pathway () extends from the fluid inlet () and defines a vortex region () between the inner peripheral wall () of the chamber () and the membrane surface () and is adapted for receiving incoming fluid. An inlet flow shield () is concentrically located about the filter assembly () and is adapted to block at least a portion of fluid flowing into the chamber () from the fluid inlet () from impacting the membrane surface ().