The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Jul. 16, 2014
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Emily Yixie Shu, Shanghai, CN;
Abstract
EUVL light source systems and methods are provided. A laser or a high-voltage-discharge device is used to excite EUV light source material to generate EUV light along with droplets flying out of the EUV light source material. A collector is positioned to guide the EUV light into a desired direction. A cooling assembly is configured to wrap around the collector along the EUV light in the desired direction. At least a first portion of the plurality of molten droplets reaches and condenses on a surface of the cooling assembly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile