The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2015

Filed:

Aug. 23, 2013
Applicant:

Htc Corporation, Taoyuan, Taoyuan County, TW;

Inventors:

Ching-Fu Lin, Taoyuan, TW;

Pol-Lin Tai, Taoyuan, TW;

Huai-Che Lee, Taoyuan, TW;

Jing-Lung Wu, Taoyuan, TW;

Hsin-Ti Chueh, Taoyuan, TW;

Assignee:

HTC CORPORATION, Taoyuan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 5/228 (2006.01); H04N 5/217 (2011.01); H04N 5/262 (2006.01);
U.S. Cl.
CPC ...
H04N 5/217 (2013.01); H04N 5/2628 (2013.01);
Abstract

An embodiment of the invention discloses a face-slimming method applied to a series of images captured by an electronic device. The process begins to receive a current image from the series of captured images and detects at least one face landmark corresponding to a face region of the current image. The face landmark of the current image is compared with a reference landmark and a distortion mask is adjusted accordingly. And then, a size of the face region within the current image is then adjusted according to the distortion mask, where the distortion mask corresponds to positions of the face landmark.


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