The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Sep. 19, 2013
International Business Machines Corporation, Armonk, NY (US);
Karl R. Erickson, Rochester, MN (US);
Phil C. Paone, Rochester, MN (US);
David P. Paulsen, Dodge Center, MN (US);
John E. Sheets, II, Zumbrota, MN (US);
Gregory J. Uhlmann, Rochester, MN (US);
Kelly L. Williams, Rochester, MI (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A semiconductor device includes a first fin rising out of a semiconductor base. It further includes a second fin rising out of the semiconductor base. The second fin is substantially parallel to the first fin that forms a span between the first fin and the second fin. A first dielectric layer is deposited on exposed surfaces of a first gate body area of the first fin, a second gate body area of the second fin, and an adjacent surface of the semiconductor base that defines the span between the first and second gate body areas. A gate electrode layer is sandwiched between the first dielectric layer and a second dielectric layer. The semiconductor device includes a third fin interdigitated between the first fin and the second fin within the span. Exposed surfaces of the gate body area of the third fin are in contact with the second dielectric layer.