The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Sep. 13, 2012
Sang-joon Seo, Yongin, KR;
Myung-soo Huh, Yongin, KR;
Seung-hun Kim, Yongin, KR;
Jin-kwang Kim, Yongin, KR;
Cheol-rae JO, Yongin, KR;
Choel-min Jang, Yongin, KR;
Jeong-ho Yi, Yongin, KR;
Sang-Joon Seo, Yongin, KR;
Myung-Soo Huh, Yongin, KR;
Seung-Hun Kim, Yongin, KR;
Jin-Kwang Kim, Yongin, KR;
Cheol-Rae Jo, Yongin, KR;
Choel-Min Jang, Yongin, KR;
Jeong-Ho Yi, Yongin, KR;
Samsung Display Co., Ltd., Giheung-Gu, Yongin, Gyeonggi-Do, KR;
Abstract
In a thin film deposition apparatus and a thin film deposition method using the same, a first spraying unit and a second spraying unit which are separately driven are prepared, the first spraying unit is driven to sequentially spray a first deposition source and an inert gas onto a substrate, a chamber is exhausted to remove, from the chamber, excess first deposition sources that are not adsorbed onto the substrate from the chamber, a second spraying unit is driven to sequentially spray a second deposition source and an inert gas onto the substrate, and the chamber is exhausted to remove, from the chamber, excess second deposition sources that are not adsorbed onto the substrate. When the thin film deposition method is used, the unintended generation of microparticles during deposition is sufficiently suppressed.