The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Dec. 10, 2009
Kazuyoshi Honda, Osaka, JP;
Yasuharu Shinokawa, Osaka, JP;
Hiromasa Yagi, Osaka, JP;
Satoshi Shibutani, Osaka, JP;
Sadayuki Okazaki, Osaka, JP;
Yuko Ogawa, Osaka, JP;
Daisuke Suetsugu, Osaka, JP;
Kazuyoshi Honda, Osaka, JP;
Yasuharu Shinokawa, Osaka, JP;
Hiromasa Yagi, Osaka, JP;
Satoshi Shibutani, Osaka, JP;
Sadayuki Okazaki, Osaka, JP;
Yuko Ogawa, Osaka, JP;
Daisuke Suetsugu, Osaka, JP;
Abstract
Deterioration of the degree of vacuum in a vacuum chamber is prevented while securing adequate cooling performance by gas cooling. A substrateis provided in a vacuum, and the cooling bodyis provided close to a film non-formation surface of the substrate. A thin film is formed by depositing a film forming material on a film formation surface of the substratewhile introducing a cooling gas into between the substrateand the cooling body. At this time, a gas which reacts with the film forming material is introduced as the cooling gas.