The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Nov. 24, 2010
Hiromoto Ohno, Tokyo, JP;
Toshio Ohi, Tokyo, JP;
Haruaki Ito, Tokyo, JP;
Fanil Makhmutov, Moscow, RU;
Hiromoto Ohno, Tokyo, JP;
Toshio Ohi, Tokyo, JP;
Haruaki Ito, Tokyo, JP;
Fanil Makhmutov, Moscow, RU;
SHOWA DENKO K.K., Tokyo, JP;
Abstract
The present invention relates to a method for producing monosilane and tetraalkoxysilane comprising subjecting alkoxysilane represented by formula (1)HSi(OR)  (1)wherein R represents alkyl group having 1 to 6 carbon atoms and n represents an integer of from 1 to 3, to disproportionation reaction in a gaseous phase in the presence of an inorganic phosphate or a catalyst having a specific chemical structure based on a heteropolyacid salt structure. In the production method of the present invention, separation from the solvent can be carried out easily, the reaction proceeds quickly and the conversion rate of the starting materials is high.