The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Jun. 01, 2010
Applicants:
Kai-uwe Schöning, Oberwil, CH;
Adriana Edenharter, Zürich, CH;
Stefan Hauck, Lampertheim, DE;
Inventors:
Assignee:
BASF SE, Ludwigshafen, DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D 471/10 (2006.01); C07D 498/10 (2006.01); C08K 5/353 (2006.01); C08K 3/22 (2006.01); C08K 5/49 (2006.01);
U.S. Cl.
CPC ...
C07D 471/10 (2013.01);
Abstract
The disclosure concerns sterically hindered amine light stabilizers (HALS) with low basicity at the nitrogen atom and high thermal stability. They are characterized by their spiro-substitution in the 4-position of the tetramethylpiperidine ring (Spiro-NOR-HALS). These compounds are useful in stabilizing polymers, especially thermoplastic polyolefins, against the deleterious effects of oxidative, thermal and actinic radiation. The compounds are also useful in stabilizing acid catalyzed and ambient cured coatings systems. They are particularly useful when high processing temperatures are additional required.