The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2015

Filed:

Jun. 13, 2012
Applicants:

Jason Lefevre, Penfield, NY (US);

James Michael Chappell, Webster, NY (US);

Paul Mcconville, Webster, NY (US);

James Edward Williams, Penfield, NY (US);

Inventors:

Jason LeFevre, Penfield, NY (US);

James Michael Chappell, Webster, NY (US);

Paul McConville, Webster, NY (US);

James Edward Williams, Penfield, NY (US);

Assignee:

Xerox Corporation, Norwalk, CT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B41F 35/00 (2006.01); B41F 23/06 (2006.01); B41F 23/00 (2006.01);
U.S. Cl.
CPC ...
B41F 23/06 (2013.01); B41F 23/00 (2013.01);
Abstract

An approach is provided for applying a release agent to a substrate having a first surface and a second surface. The approach involves causing, at least in part, a release agent supply device to supply release agent to a release agent applicator. The approach also involves causing, at least in part, a release agent metering device configured to control an amount of release agent applied to a roller configured to apply release agent to the first surface of the substrate. The roller is configured to accommodate the substrate under a tension over at least a portion of a circumference of the roller such that a pressure is exerted between the roller and the first surface of the substrate.


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