The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Nov. 09, 2010
Applicants:
Jordan Crist, Vancouver, WA (US);
Jason N. Farmer, Vancouver, WA (US);
Robert G. Waarts, Los Altos, CA (US);
Inventors:
Jordan Crist, Vancouver, WA (US);
Jason N. Farmer, Vancouver, WA (US);
Robert G. Waarts, Los Altos, CA (US);
Assignee:
nLight Photonics Corporation, Vancouver, WA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2014.01); B23K 26/36 (2014.01); B23K 26/06 (2014.01); B23K 26/40 (2014.01);
U.S. Cl.
CPC ...
B23K 26/36 (2013.01); B23K 26/0635 (2013.01); B23K 26/4075 (2013.01); B23K 2201/40 (2013.01);
Abstract
Scribing operations with reduced substrate heating can be provided by applying multiple optical pulses to a substrate within a time interval that is less than a material recombination time. Typically a series of pulses of durations of 5-200 ps with pulse energies of less than about 0.002 mJ can be applied at rates of about 1 MHz to about 30 MHz. Beam area and beam scanning are configured to provide substantial overlap so that material can be removed by cold ablation.