The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Jun. 08, 2009
Christoph Bert, Aschaffenburg, DE;
Eike Rietzel, Weiterstadt, DE;
Christoph Bert, Aschaffenburg, DE;
Eike Rietzel, Weiterstadt, DE;
GSI Helmholtzzentrum für Schwerionenforschung GmbH, Darmstadt, DE;
Abstract
The invention concerns a process for the deposition of an intended dose distribution in a cyclically moved target region moving cyclically () by means of multiple irradiations with a beam () approaching matrix points of a target matrix in at least two scannings, wherein in each of the scannings, matrix points are approached sequentially. It is characterized through the steps: establishing the maximal tolerance level for local deviation from the intended dose distribution, de-synchronizing the sequence of the irradiation and the cyclical motion of the target region (), and partitioning the irradiation of the target region () in a sufficient number of scannings such that local deviations from the intended dose distribution correspond at most to the maximal tolerance level of deviation from the intended dose distribution. Furthermore, the invention also concerns an irradiation apparatus for executing a process of this type and a process for determining the control parameters for said irradiation apparatus.