logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9042417 B1

PDFFull Text
Date of Patent:
May. 26, 2015

Filed:

Nov. 13, 2013

Photonic device structure and fabrication method thereof

Applicant:

Sifotonics Technologies Co., Ltd., Woburn, MA (US);

Inventors:

Mengyuan Huang, Beijing, CN;

Liangbo Wang, Beijing, CN;

Wang Chen, Beijing, CN;

Ching-yin Hong, Lexington, MA (US);

Dong Pan, Andover, MA (US);

Assignee:

SiFotonics Technologies Co., Ltd., Woburn, MA (US);

Attorney:

Han IP Corporation

Primary Examiner:

Kinam Park

Int. Cl.
CPC ...
H01S 5/00 (2006.01); H01L 31/18 (2006.01); H01L 31/0232 (2014.01); H01S 5/20 (2006.01); H01S 5/22 (2006.01); H01S 5/183 (2006.01);
U.S. Cl.
CPC ...
H01L 31/18 (2013.01); H01L 31/0232 (2013.01); H01S 5/2004 (2013.01); H01S 5/2018 (2013.01); H01S 5/2205 (2013.01); H01S 5/20 (2013.01); H01S 5/18325 (2013.01); H01S 5/18341 (2013.01); H01S 5/2059 (2013.01);
Abstract

Various embodiments of a photonic device and fabrication method thereof are provided. In one aspect, a device includes a substrate, a current confinement layer disposed on the substrate, an absorption layer disposed in the current confinement layer, and an electrical contact layer disposed on the absorption layer. The current confinement layer is doped in a pattern and configured to reduce dark current in the device. The photonic device may be a photodiode or a laser.

Find Patent Forward Citations

Quick Actions:

Huang, Mengyuan. (2015). Photonic device structure and fabrication method thereof (U.S. Patent No. 9042417). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9042417

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…