The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2015

Filed:

Mar. 24, 2014
Applicant:

The United States of America As Represented BY the Secretary of the Navy, Washington, DC (US);

Inventors:

Michael Johnny Wardlaw, King George, VA (US);

Ramesh Kumar Shori, Burbank, CA (US);

Ralph Steven Kurti, Phelan, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G02B 27/09 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0927 (2013.01); G02B 27/0905 (2013.01); G02B 5/3025 (2013.01);
Abstract

Method and apparatus to generate a composite far field beam having a central null and discrete cylindrical symmetry. A phased array of Gaussian beams was used to form an annular far-field pattern as opposed to the normal peaked pattern in most phased arrays. This annular pattern arises from the radial symmetry of the polarization in each beam. Beams opposite one another in the annulus are polarized in the same direction but are 180° out of phase. This causes the center portion of the beam to be a null rather than a peak.


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