The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2015

Filed:

Dec. 20, 2011
Applicant:

Alton H. Phillips, East Palo Alto, CA (US);

Inventor:

Alton H. Phillips, East Palo Alto, CA (US);

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G02B 7/18 (2006.01); G02B 5/08 (2006.01); G03F 7/20 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G02B 7/1815 (2013.01); G02B 5/0891 (2013.01); G03F 7/70825 (2013.01); G03F 7/70891 (2013.01); G21K 1/06 (2013.01); G21K 2201/065 (2013.01);
Abstract

Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger includes at least one well defined therein. The mirror assembly includes a mirror block having a mirrored surface. The mirror assembly also has at least one surface. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The at least one surface is in contact with the liquid metal to transfer heat from the mirror block to the heat exchanger.


Find Patent Forward Citations

Loading…