The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2015

Filed:

Jul. 27, 2012
Applicant:

Scott T. Smith, San Jose, CA (US);

Inventor:

Scott T. Smith, San Jose, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H04N 5/235 (2006.01); G03B 7/083 (2006.01); H04N 5/355 (2011.01);
U.S. Cl.
CPC ...
H01L 27/14621 (2013.01); H04N 5/2352 (2013.01); G03B 7/083 (2013.01); H04N 5/35536 (2013.01); H04N 5/2353 (2013.01); H01L 27/14643 (2013.01);
Abstract

To generate data for color pixels in an image, Bayer symmetric interleaved exposures can more evenly spread the long exposure pixels in the vertical direction and produce a higher dynamic range by having pixels with different exposure times interleaved within different rows. Long and short exposure pixels can be interleaved across two adjacent rows to form 4 pixel wide by 2 pixel tall blocks that are repeated across a Bayer pattern color array. In each block, the first row can be three long and one short exposure pixel; and the second row can be three short and one long exposure pixel. The long exposure pixels can form an 'L' shaped pattern rotated 90 degrees clockwise; and the short exposure pixels can form an 'L' shaped pattern rotated 90 degrees counter-clockwise. Subsequent rows of the blocks may be offset horizontally to form diagonal bands of long and short exposure pixels.


Find Patent Forward Citations

Loading…