The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2015

Filed:

Mar. 09, 2011
Applicants:

Paul Kuad, Mulhouse, FR;

Hisaaki Kanda, Hyogo, JP;

Takeshi Fujiwara, Hyogo, JP;

Hiroyuki Shiraishi, Hyogo, JP;

Inventors:

Paul Kuad, Mulhouse, FR;

Hisaaki Kanda, Hyogo, JP;

Takeshi Fujiwara, Hyogo, JP;

Hiroyuki Shiraishi, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 323/65 (2006.01); C07C 327/06 (2006.01); C07D 331/02 (2006.01); C07C 319/06 (2006.01);
U.S. Cl.
CPC ...
C07C 323/65 (2013.01); C07C 327/06 (2013.01); C07D 331/02 (2013.01); C07C 319/06 (2013.01);
Abstract

The present invention provides a diaryl sulfone compound represented by Formula (1) below: wherein Rto Rand Rto Rare the same or different; each represents hydrogen, Calkyl, or halogen; and Ris (thio)glycidyl, acryloyl, or the like; and a method for producing the same. According to the present invention, a novel compound useful as a monomer for producing synthetic resin having a high refractive index and excellent transparency for optical materials can be efficiently produced with a simple production process, using an inexpensive material as a starting material.


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