The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2015
Filed:
Sep. 03, 2012
Ji Young Hwang, Daejeon, KR;
Jeseob Park, Seoul, KR;
In-seok Hwang, Daejeon, KR;
Seung Heon Lee, Daejeon, KR;
Ji Young Hwang, Daejeon, KR;
Jeseob Park, Seoul, KR;
In-Seok Hwang, Daejeon, KR;
Seung Heon Lee, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
The present invention relates to a cliché and a method for manufacturing the same, and the cliché according to the present invention comprises a cliché comprising: a groove pattern, wherein the groove pattern comprises a region composed of linear patterns which do not intersect with each other and the region composed of linear patterns is a square region comprising two or more lines of a linear pattern in the region and comprises a region in which the line width (W) and the depth (D) of the linear pattern and the ratio (R) of a region which does not comprise the linear pattern in the square region and the aperture line width (W) of a mask pattern for forming a pattern, which corresponds to the linear pattern, satisfy specific relationship equation(s). The cliché according to the present invention may prevent the bottom touch phenomenon of ink transferred onto the cliché.