The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2015
Filed:
Nov. 12, 2012
Applicant:
Hitachi Kokusai Electric Inc., Nakano-ku, Tokyo, JP;
Inventors:
Kazuyuki Toyoda, Nakano-ku, JP;
Yasuhiro Inokuchi, Nakano-ku, JP;
Motonari Takebayashi, Nakano-ku, JP;
Tadashi Kontani, Nakano-ku, JP;
Nobuo Ishimaru, Nakano-ku, JP;
Assignee:
HITACHI KOKUSAI ELECTRIC INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); H01L 21/77 (2006.01); C23C 16/452 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/54 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/205 (2006.01); H01L 21/316 (2006.01);
U.S. Cl.
CPC ...
H01L 21/77 (2013.01); C23C 16/452 (2013.01); C23C 16/45525 (2013.01); C23C 16/45542 (2013.01); C23C 16/45546 (2013.01); C23C 16/45578 (2013.01); C23C 16/4583 (2013.01); C23C 16/4584 (2013.01); C23C 16/54 (2013.01); H01J 37/32357 (2013.01); H01J 37/3244 (2013.01); H01L 21/31604 (2013.01); H01L 21/67109 (2013.01); H01L 21/205 (2013.01);
Abstract
A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which high frequency electricity is applied; and a gas supply member which supplies processing gas into a space between the pair of electrodes.